Chemical Vapor Deposition Market Worth $48.01
Billion By 2025
The global chemical vapor deposition (CVD) market size is projected to value USD 48.01 billion by 2025. The rising
demand among the semiconductor industry has contributed significantly to market growth. Moreover, rising awareness
relating to the advantages provided by these products coupled with consumer trends for durable and modern electronic
devices has led to the rising adoption of CVD coating in different applications.
CVD technology is used for manufacturing high-performance materials mostly to produce thin films required in the
semiconductor industry. The procedure for the same involves the contact between substrate/ wafer and a volatile
precursor, the reaction of which forms various kinds of deposits like pyrolytic coating, or hard coatings.
Generally, the CVD coatings disclose high adherence to glass surfaces and are placed at heating temperatures. In the
process, the volatile precursors include hydride (GeG4, ammonia, and SiH4), metal-organic compounds (alkoxides/
diketonates/dialylamides/carbonyls, metal alkyls), halides (TaCl5, TiCl4, WF6), and complexes and ligands.
The market players are currently emphasizing at creating solutions for hybrid thin organic-inorganic deposition films to
minimize the production costs thus, boosting the semiconductor industry. This rising trend has resulted in an extensive
distribution of titanium compounds abiding by environmental regulations.
CVD equipment accounted for the largest market share in 2016 and is predicted to continue with its average growth rate
during the forecast period due to better standards of deposition films acquired from the equipment. CVD services
accounted for the fastest-growing segment due to technological up gradations like plasma intensified process,
combustion and hot-wire based.
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