FOR IMMEDIATE RELEASE
June 1, 2006
Laboratory Open for Cleaning Application Demonstrations
using Novel EHD Technology
Duarte, CA……. EHD Technology Group announced today the opening of its
electrohydrodynamic (EHD) laboratory in Duarte, approximately 25 miles northeast of
Los Angeles. The demonstration laboratory has been designed to demonstrate EHD’s
unique benefits to the challenges of cleaning nanoscale contaminants from surfaces such
as silicon wafers during microchip manufacture.
EHD promises a number of benefits over traditional wafer cleaning technologies. The
process generates uniquely-small nanodroplet that can enter fine patterns, and is
essentially a dry technology, eliminating surface wetting and attendant watermark
problems. EHD uses extremely low amounts of fluids, as little as 2 microliters per
minute per nozzle, so operating costs are reduced, and processes become more
environmentally green. Because EHD can operate in vacuum environments, it is ideal for
use between vacuum processes, as it can reduce contaminants from repeated pump/vent
cycles.
The new EHD demonstration laboratory can process wafer segments, or coupons, for
demonstration of its capabilities on a wide range of thin films and substrates. The facility
can handle whole wafer up to 200 mm in diameter, but cleaning is limited to spots and
stripes, with a cleaning beam of approximately 1” in diameter.
EHD Technology Group creates a written report at the conclusion of testing so that
prospective EHD users can see the results of various EHD beam settings in terms of
surface cleaning effects.
For more information, contact Ken Finster, President & CTO, at (626) 357-7350, or
through kfinster@ehdtg.com.
About EHD Technology Group
EHD Technology Group, Inc. develops electrohydrodynamic (EHD) emission arrays for
integration into semiconductor OEM equipment for post-process strip, cleaning, finishing,
drying, and coating applications. The company participates in j