*** Text Omitted and Filed Separately
Pursuant to a Confidential Treatment Request
under 17 C.F.R. §§ 200.80(b)(4) and 240.24b-2(b)(1)
INTELLECTUAL PROPERTY LICENSE AGREEMENT
“CYMER” CORPORATION AND INTEL CORPORATION
The Intellectual Property License Agreement of January 28, 2004 is hereby Amended (“Amended License
Agreement”) as of June 27, 2006 (“Effective Date”) by and between Cymer, Inc. a Nevada corporation, having
an office at 17075 Thornmint Ct., San Diego, California, 92127, USA, (“Cymer”) and Intel Corporation, a
Delaware corporation, having an office at 2200 Mission College Blvd., Santa Clara, California 95052, U.S.A.
WHEREAS , Cymer intends to commercialize EUV systems for an anticipated business opportunity,
WHEREAS, the January 2004 Agreement is subject to termination if Cymer does not commercialize a Cymer
Licensed Product by
[ . . . * * * . . . ], and
WHEREAS, Cymer intends to use certain of the Intel Patents, Exhibit A of this Amended License Agreement
beyond [ . . . * * * . . . ],
NOW, THEREFORE, IN CONSIDERATION OF THE MUTUAL COVENANTS AND PROMISES
CONTAINED HEREIN, THE PARTIES AGREE TO AMEND THE JANUARY 2004 AGREEMENT AS
1.1. “EUV” means extreme ultraviolet lithography.
1.2. “EUV Source System” means a system including all apparatus to deliver debris-free, in-band, collected
photons based on a [ . . . * * * . . . ] or a [ . . . * * * . . . ] to the intermediate focus of the EUV
lithography system for generating a supply of such collected photons at a central wavelength in the range
of [ . . . * * * . . . ].
1.3. “Intermediate Focus” means the illuminator entrance of the EUV Lithography System, such illuminator
entrance being downstream of the collection optics, debris mitigation system and optional spectr